Si(001) surface oxidation

  • A Si(001) surface is cleaned in UHV by heating (flashing) and is exposed to different pressures of N2O at altered temperatures. Oxynitride layers of different thicknesses and different properties are grown depending on the N2O-pressure and the Si- temperature. This is illustrated by a schematic diagram. The properties of the different Oxynitride layers were studied by a combined PEEM- and PES-investigation using highly monochromatised synchrotron radiation. The amount of Oxygen and Nitrogen incorporated in the Oxynitride layers is determined from the PES measurements. The typical surface morphology for different preparation conditions is shown in PEEM images. A model based on differently established dipole layers in the Oxynitride layers is proposed. This model is capable of interpreting the features appearing in the PE-spectra. This model can also be applied to the interface of Si/SiO2.

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Metadaten
Author: Patrick Hoffmann, Ricardo Pablo Mikalo, Dieter SchmeißerORCiD
URL:http://www.dpg-verhandlungen.de/year/2001/conference/hamburg/part/o/session/13/contribution/75?lang=de
Title of the source (German):Verhandlungen der Deutschen Physikalischen Gesellschaft
Publisher:Deutsche Physikalische Gesellschaft
Place of publication:Bad Honnef
Document Type:Conference Proceeding
Language:English
Year of publication:2001
Tag:X-ray photoelectron spectroscopy (XPS); oxynitride; photoemssion electron spectroscopy (PEEM)
Series ; volume number:Verhandlungen der Deutschen Physikalischen Gesellschaft ; Reihe 6, Band 36
Faculty/Chair:Fakultät 1 MINT - Mathematik, Informatik, Physik, Elektro- und Informationstechnik / FG Angewandte Physik und Halbleiterspektroskopie
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