Analysis of nitrogen species in titanium oxynitride ALD films

  • Titanium oxynitride films are prepared by plasma enhanced atomic layer deposition method using two different precursors and nitrogen sources. Synchrotron radiation-based X-ray photoelectron spectroscopy and X-ray absorption spectroscopy are used to characterize the nitrogen species incorporated within these films depending on the deposition parameters. It is found that nitrogen atoms in these films are differently bonded. In particular, it can be distinguished between Ti-ON and Ti-N bonding configurations and molecular nitrogen species caused by precursor fragments.

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Author: Małgorzata Sowinska, Simone Brizzi, Chittaranjan DasORCiD, Irina Kärkkänen, Jessica Schneidewind, Franziska NaumannORCiD, Hassan Gargouri, Karsten HenkelORCiDGND, Dieter SchmeißerORCiD
DOI:https://doi.org/10.1016/j.apsusc.2016.02.096
ISSN:0169-4332
ISSN:1873-5584
Title of the source (English):Applied Surface Science
Document Type:Scientific journal article peer-reviewed
Language:English
Year of publication:2016
Tag:ALD process parameters; X-ray absorption spectroscopy; X-ray photoelectron spectroscopy; titanium oxynitride
Volume/Year:381
First Page:42
Last Page:47
Faculty/Chair:Fakultät 1 MINT - Mathematik, Informatik, Physik, Elektro- und Informationstechnik / FG Angewandte Physik und Halbleiterspektroskopie
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