Tailoring the strain in Si nano-structures for defect-free epitaxial Ge overgrowth
Author: | Peter Zaumseil, Yuji Yamamoto, M. Schubert, Giovanni CapelliniORCiD, Oliver Skibitzki, Marvin H. Zöllner, Thomas Schroeder |
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DOI: | https://doi.org/10.1088/0957-4484/26/35/355707 |
ISSN: | 1361-6528 |
Title of the source (English): | Nanotechnology |
Document Type: | Scientific journal article peer-reviewed |
Language: | English |
Year of publication: | 2015 |
Volume/Year: | 26 |
Issue number: | 35 |
First Page: | 355707 |
Faculty/Chair: | Fakultät 1 MINT - Mathematik, Informatik, Physik, Elektro- und Informationstechnik / FG Halbleitermaterialien |